LITHOGRAPHIC APPARATUS AND METHOD

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KNARREN, Bastiaan Andreas Wilhelmus Hubertus, BLOKS, Ruud Hendrikus Martinus Johannes, KUSTERS, Gerardus Adrianus Antonius Maria, KUNNEN, Johan Gertrudis Cornelis, LAFARRE, Raymond Wilhelmus Louis, STEFFENS, Koen, CORCORAN, Gregory Martin Mason, VOOGD, Robbert Jan, LAURENT, Thibault Simon Mathieu, KANEKO, Takeshi, BADIE, Ramin
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.