Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...
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| creator | VAN KRAAIJ, Markus Gerardus Martinus PELLEMANS, Henricus Petrus Maria VAN DER SCHAAR, Maurits LUEHRMANN, Paul Frank DEN BOEF, Arie Jeffrey Maria BLEEKER, Arno Jan DUSA, Mircea KIERS, Antoine Gaston Marie GROUWSTRA, Cedric Desire VAN DOMMELEN, Youri Johannes Laurentiu |
| description | An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. |
| format | Patent |
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The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING |
| title | Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization |
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