Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...

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Bibliographische Detailangaben
Hauptverfasser:	VAN KRAAIJ, Markus Gerardus Martinus, PELLEMANS, Henricus Petrus Maria, VAN DER SCHAAR, Maurits, LUEHRMANN, Paul Frank, DEN BOEF, Arie Jeffrey Maria, BLEEKER, Arno Jan, DUSA, Mircea, KIERS, Antoine Gaston Marie, GROUWSTRA, Cedric Desire, VAN DOMMELEN, Youri Johannes Laurentiu
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.