LASER LINE ILLUMINATION
A laser system is configured for providing a laser line (L) in a working plane (WP) for line illumination of an object. The laser line (L) extends in a first direction (x) over a significant length and in a second direction (y) over a small extent. The laser system includes a laser source for provid...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A laser system is configured for providing a laser line (L) in a working plane (WP) for line illumination of an object. The laser line (L) extends in a first direction (x) over a significant length and in a second direction (y) over a small extent. The laser system includes a laser source for providing a laser beam as basis for an elongated input laser beam propagating along a propagation direction (z), and a homogenization and focusing unit for homogenizing the elongated laser beam to form the laser line (L). The laser system is, for example, suitable for providing a laser line (L) that can be stitched to another laser line (L′) of another laser system. |
---|