SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate includes a dielectric layer, a circuit layer, a first protection layer and a plurality of conductive posts. The dielectric layer has a first surface and a second surface that are opposite to each o...

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Bibliographische Detailangaben
Hauptverfasser: Lee, Chih-Cheng, Su, Yuan-Chang, Yen, You-Lung, Lee, Chun-Che, Chen, Tien-Szu, Lee, Ming-Chiang
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate includes a dielectric layer, a circuit layer, a first protection layer and a plurality of conductive posts. The dielectric layer has a first surface and a second surface that are opposite to each other. The circuit layer is embedded in the dielectric layer and is exposed from the first surface. The first protection layer covers a portion of the first circuit layer and defines a plurality of holes that expose a remaining portion of the first circuit layer. The conductive posts are formed in the holes.