SHOWERHEAD AND SUBSTRATE PROCESSING DEVICE INCLUDING THE SAME

A showerhead has a body portion includes first and second surface opposite surfaces, a gas supply channel open at the first surface, and a plurality of gas injecting holes connected to the gas supply channel and open at the second surface to allow gas delivered through the gas supply channel to be d...

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Bibliographische Detailangaben
Hauptverfasser:	BAN, DAE GYU, UM, JUNG HWAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A showerhead has a body portion includes first and second surface opposite surfaces, a gas supply channel open at the first surface, and a plurality of gas injecting holes connected to the gas supply channel and open at the second surface to allow gas delivered through the gas supply channel to be discharged from the showerhead at the second surface. The second surface has a first region and a second region, divided by a first virtual line passing through a center of the second surface. The gas injecting holes are inclined in directions substantially perpendicular to the first virtual line to discharge gas in directions away from the first virtual line, and gas injecting holes open at the first region and the second region are inclined in opposite directions.