METHOD OF LASER SCRIBING OF SEMICONDUCTOR WORKPIECE USING DIVIDED LASER BEAMS

This invention provides an effective and rapid method of laser processing for separating semiconductor devices formed on hard and solid substrates (6) with a one pass process. The method is based on generating fractures along the scribing trajectory which extend deep into the bulk of a workpiece (6)...

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Bibliographische Detailangaben
Hauptverfasser: KIMBARAS, Dziugas, VESELIS, Laurynas, VANAGAS, Egidijus
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:This invention provides an effective and rapid method of laser processing for separating semiconductor devices formed on hard and solid substrates (6) with a one pass process. The method is based on generating fractures along the scribing trajectory which extend deep into the bulk of a workpiece (6), wherein thermal stress is induced by delivering at least two processing (ultra short pulse) pulsed-beams (7), containing at least primary and secondary pulses. Primary pulses are used to generate a heat accumulated zone, which allows for more efficient absorption of the secondary pulses, which generate a sufficient heat gradient to produce mechanical failures, necessary for mechanically separating the workpiece (6) into separate pieces.