SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus includes an exhaust unit including a lower surface in which an outlet is formed and four side walls extended from the lower surface, the exhaust unit having exhaust wings protruding from two opposing side walls, a shower head located in the exhaust unit and having di...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIM, Byeong Sang, KIM, Dong Wook, CHOI, Myoung Soo, SOHN, Ki Ju, LEE, Ju Hyun, PARK, Kyung Bin, SHIM, Woo Sub, KIM, Jung Wook, YU, Ho, HWANG, Eun Soo
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A substrate processing apparatus includes an exhaust unit including a lower surface in which an outlet is formed and four side walls extended from the lower surface, the exhaust unit having exhaust wings protruding from two opposing side walls, a shower head located in the exhaust unit and having distribution holes, and an adjuster disposed on each of side walls of the exhaust unit between the exhaust wings.