EVALUATION METHOD, DETERMINATION METHOD, LITHOGRAPHY APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM

The present invention provides an evaluation method of evaluating a measurement condition of a position of a mark formed on a substrate, the method comprising: obtaining a mark signal representing an intensity distribution of reflected light by detecting the reflected light from the mark under the m...

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1. Verfasser: Murayama, Genki
Format: Patent
Sprache:eng
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Zusammenfassung:The present invention provides an evaluation method of evaluating a measurement condition of a position of a mark formed on a substrate, the method comprising: obtaining a mark signal representing an intensity distribution of reflected light by detecting the reflected light from the mark under the measurement condition; generating a plurality of signals from the mark signal by changing a first signal component of a first frequency included in the mark signal obtained in the obtaining; and estimating a position of the mark from each of the plurality of signals obtained in the generating, and obtaining a variation in estimated position of the mark as an evaluation index of the measurement condition.