SYSTEMS AND PROCESSES FOR PRODUCING RELATIVELY UNIFORM TRANSVERSE IRRADIATION FIELDS OF CHARGED-PARTICLE BEAMS

SYSTEMS AND PROCESSES FOR PRODUCING RELATIVELY UNIFORM TRANSVERSE IRRADIATION FIELDS OF CHARGED-PARTICLE BEAMS

The hybrid beam emittance uniformization system includes a charged particle beam generator for emitting a plurality of charged particles, a quadrupole magnet positioned relatively inline with the charged particle beam generator, and an adjustable aperture quadrupole positioned inline with the charge...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Rosenzweig, James Benjamin, Yakub, Andrew X, Liu, Mingguo, Vartanian, Ninel
Format: Patent
Sprache:eng
Schlagworte:
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:The hybrid beam emittance uniformization system includes a charged particle beam generator for emitting a plurality of charged particles, a quadrupole magnet positioned relatively inline with the charged particle beam generator, and an adjustable aperture quadrupole positioned inline with the charged particle beam generator, wherein the combination of the quadrupole magnet and the adjustable aperture quadrupole concentrate the plurality of charged particles emitted by the charged particle beam generator into a relatively uniform square beam having a relatively uniform flux density all throughout a target area positioned a target distance from the charge particle beam generator.