LASER PROCESSING METHOD

According to one embodiment, a laser processing method includes irradiating a region of a substrate with first laser light having a first pulse width greater than ten nanoseconds and irradiating the region substrate with second laser light having a second pulse width less than the first pulse width....

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Bibliographische Detailangaben
1. Verfasser: MATSUO, Mie
Format: Patent
Sprache:eng
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