MULTI-ROW WIRING MEMBER FOR SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

A multi-row wiring member for semiconductor device configured of a plurality of wiring members arrayed in a matrix includes a resin layer, a first plating layer forming internal terminals, a plating layer forming wiring portions and a second plating layer forming external terminals. The first plating layer is formed in the resin layer with lower faces thereof uncovered in the bottom surface of the resin layer. The plating layer forming wiring portions is formed on the first plating layer in the resin layer. The second plating layer is formed on partial areas within areas of the plating layer forming wiring portions, with upper faces thereof being uncovered on a top-surface side of the resin layer. On a bottom-surface side of the resin layer, a resin frame is integrally formed with the resin layer at the margin around an aggregate of individual wiring members for semiconductor devices arrayed in a matrix.