Cooled Focus Ring for Plasma Processing Apparatus

A pedestal assembly for use in a plasma processing apparatus for processing a substrate includes a baseplate. The pedestal assembly can further include a puck configured to support a substrate. The pedestal assembly can further include a focus ring arranged relative to the puck such that at least a portion of the focus ring at least partially surrounds a periphery of the substrate when the substrate is positioned on the puck. In addition, the focus ring can be spaced apart from the puck so that a gap is defined therebetween. The pedestal assembly can further include a thermally conductive member spaced apart from the puck. The thermally conductive member can be in thermal communication with the focus ring surrounded by the inner insulator ring and configured to be in thermal communication with the focus ring and the baseplate.