METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE

A method for manufacturing a color filter substrate is provided in the present disclosure, that includes providing a substrate; forming a plurality of RGB color resists on the substrate, an upper surface of each of the RGB color resists forming a plurality of light emitting regions; forming a black...

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Bibliographische Detailangaben
Hauptverfasser:	LI, Wenjie, IGUCHI, Shinsuke
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method for manufacturing a color filter substrate is provided in the present disclosure, that includes providing a substrate; forming a plurality of RGB color resists on the substrate, an upper surface of each of the RGB color resists forming a plurality of light emitting regions; forming a black matrix on the surface of each of the RGB color resists, wherein the black matrix covers a portion of the surface of each of the RGB color resists except the light emitting regions; forming a plurality of photo spacers on a surface of the black matrix in a plurality of empty areas within each of the RGB color resists, wherein the adjacent photo spacers are separated by one of the color resist regions; and forming a protective layer over the substrate.