VARIABLE STEALTH LASER DICING PROCESS

Embodiments are provided herein for separating integrated circuit (IC) device die of a wafer, the wafer having a front side with an active device region and a back side, the active device region having a plurality of active devices arranged in rows and columns and separated by cutting lanes, the met...

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Bibliographische Detailangaben
Hauptverfasser: ALBERMANN, Guido, HIGGINS, III, Leo M, Buenning, Hartmut, LAPKE, Martin, ZERNACK, Michael, MOELLER, Sascha
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments are provided herein for separating integrated circuit (IC) device die of a wafer, the wafer having a front side with an active device region and a back side, the active device region having a plurality of active devices arranged in rows and columns and separated by cutting lanes, the method including: attaching the front side of the wafer onto a first dicing tape; forming a modification zone within each cutting lane through the back side of the wafer, wherein each modification zone has a first thickness near a corner of each active device and a second thickness near a center point of each active device, wherein the second thickness is less than the first thickness; and propagating cracks through each cutting lane to separate the plurality of active devices.