VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY DEVICE

Provided is a vapor deposition apparatus capable of suppressing the occurrence of relatively large smudges not intended by design. In this vapor deposition apparatus, a recessed portion is provided in a scanning direction of a substrate in a region between two emission openings adjacent to each othe...

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Bibliographische Detailangaben
Hauptverfasser:	KAWATO, Shinichi, INOUE, Satoshi, KOBAYASHI, Yuhki
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Provided is a vapor deposition apparatus capable of suppressing the occurrence of relatively large smudges not intended by design. In this vapor deposition apparatus, a recessed portion is provided in a scanning direction of a substrate in a region between two emission openings adjacent to each other on a limiting plate side of a top plate.