STRIPPING SOLVENTS FOR PHOTOSENSITIVE RESINS

The present invention relates to the use, as a photoresist stripping solvent, of a solvent mixture including at least two of the following solvents: (51) a solvent including at least one ester amide compound of formula R1OOC-A-CONR2R3, (52) DMSO, (53) cyclopentanone.

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Bibliographische Detailangaben
1. Verfasser:	BOURDETTE, Arnaud
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to the use, as a photoresist stripping solvent, of a solvent mixture including at least two of the following solvents: (51) a solvent including at least one ester amide compound of formula R1OOC-A-CONR2R3, (52) DMSO, (53) cyclopentanone.