OVEN

Provided is an oven having an improved structure for keeping a cooking chamber clean. The oven includes a main body, a cooking chamber provided inside the main body, a main heater disposed inside the cooking chamber, a fan disposed inside the cooking chamber to circulate air heated by the main heate...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SATO, Seiji, DOI, Toshihiro, URAI, Yasushi, HAYASHI, Shigeki, TAKENOSHITA, Kazutoshi, KIDA, Yurika, IWAMOTO, Kiyoshi
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Provided is an oven having an improved structure for keeping a cooking chamber clean. The oven includes a main body, a cooking chamber provided inside the main body, a main heater disposed inside the cooking chamber, a fan disposed inside the cooking chamber to circulate air heated by the main heater, a coating film formed on at least a part of a cooking chamber inner wall and having a liquid repellency, and a contaminant collecting portion having a liquid repellency smaller than that of the coating film and provided on the cooking chamber inner wall with which air circulated by the fan collides.