EXTREME ULTRAVIOLET LIGHT SENSOR UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE

EXTREME ULTRAVIOLET LIGHT SENSOR UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE

An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SOMEYA, Hiroshi, NARA, Hisashi, ISHII, Takuya
Format: Patent
Sprache:eng
Schlagworte:
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GAMMA RAY OR X-RAY MICROSCOPES
IRRADIATION DEVICES
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultraviolet light having passed through the filter, a purge gas supply unit disposed to supply purge gas to a space between the mirror and the filter, and a pipe part configured to allow plasma light including the extreme ultraviolet light entering from an opening to pass therethrough toward the mirror and allow the purge gas flowing to the space between the mirror and the filter to flow out of the opening.