COLOR FILTER SUBSTRATE AND MANUFACTURING METHOD THEREOF

A color filter substrate and its manufacturing method are disclosed. The method includes the following steps: providing a substrate; forming a lower layer on the substrate, and patterning the lower layer to form at least an indentation; forming a black matrix layer on the lower layer and the indenta...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	DENG, Zhuming
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A color filter substrate and its manufacturing method are disclosed. The method includes the following steps: providing a substrate; forming a lower layer on the substrate, and patterning the lower layer to form at least an indentation; forming a black matrix layer on the lower layer and the indentation, and patterning the black matrix layer to form a black matrix pattern, and at least a first spacer and at least a second spacer integrally on the black matrix pattern. The first spacer is outside the indentation. The second spacer is inside the indentation. There is a vertical distance between a top side of the first spacer and a top side of the second spacer. Through the above method, the photolithographic process is simplified and production cost is reduced.