SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating method includes applying a treatment liquid containing a monomeric substance to a substrate that is intended to be cleaned, curing the treatment liquid with a cleaning film by irradiating light to th...

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Bibliographische Detailangaben
Hauptverfasser: JO, MIYOUNG, LEE, MONG-RYONG, YEON, YERIM, KORIAKIN, ANTON
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating method includes applying a treatment liquid containing a monomeric substance to a substrate that is intended to be cleaned, curing the treatment liquid with a cleaning film by irradiating light to the treatment liquid and polymerizing the monomeric substance, and removing the cleaning film.