High-Dielectric Constant Capacitor Structures on III-V Substrates

A semiconductor structure includes a III-V semiconductor structure; a first electrode; a first barrier layer disposed over the first electrode; a first adhesion layer disposed over the first electrode; a first passivation layer disposed over the first adhesion layer; a dielectric layer disposed over...

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Bibliographische Detailangaben
Hauptverfasser: Dungan, Thomas, Nikkel, Phil, Abrokwah, Jonathan, Yeldandi, Satish
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor structure includes a III-V semiconductor structure; a first electrode; a first barrier layer disposed over the first electrode; a first adhesion layer disposed over the first electrode; a first passivation layer disposed over the first adhesion layer; a dielectric layer disposed over the first passivation layer; a second passivation layer disposed over the dielectric layer; a second adhesion layer disposed over the second passivation layer; a second barrier layer disposed over the second adhesion layer; and a second electrode disposed over the second barrier layer.