Vaporizer and Substrate Processing Apparatus

Described herein is a technique capable of preventing an occurrence of the metal contamination in a vaporizer for vaporizing a liquid source. According to the technique described herein, there is provided a vaporizer including: a vaporization vessel constituted by a quartz body; and an atomizer made...

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Bibliographische Detailangaben
Hauptverfasser: KAKUDA, Toru, TANAKA, Akinori, JODA, Takuya, OKUNO, Masahisa, HARA, Daisuke, HORII, Sadayoshi, TATENO, Hideto, TSUKAMOTO, Takashi
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Described herein is a technique capable of preventing an occurrence of the metal contamination in a vaporizer for vaporizing a liquid source. According to the technique described herein, there is provided a vaporizer including: a vaporization vessel constituted by a quartz body; and an atomizer made of a fluorine resin and configured to atomize a liquid source using a carrier gas (atomization gas) and to supply the atomized liquid source into the vaporization vessel.