EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART

An exposure apparatus that exposes a substrate with light via liquid includes a stage which holds the substrate and is movable relative to a projection system; and a liquid supply system which supplies liquid onto the substrate held on the stage to form a liquid immersion area on part of the substra...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAIWA, Hiroaki, HOSHIKA, Ryuichi, ISHIZAWA, Hitoshi, NAGASAKA, Hiroyuki, HIRUKAWA, Shigeru
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An exposure apparatus that exposes a substrate with light via liquid includes a stage which holds the substrate and is movable relative to a projection system; and a liquid supply system which supplies liquid onto the substrate held on the stage to form a liquid immersion area on part of the substrate The stage includes a substrate holder arranged in a recess of the stage to hold the substrate inside the recess so that an upper surface of the substrate is substantially flush with an upper surface of the stage around the recess; a flow passage connected to an internal space of the recess to remove liquid from the internal space; and a sensor which receives light from the projection optical system and is arranged so that an upper surface of the sensor is substantially flush with the upper surface of the stage around the recess.