Mask Assembly

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the pattern...

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Bibliographische Detailangaben
Hauptverfasser:	LOOPSTRA, Erik Roelof, BRULS, Richard Joseph, JANSSEN, Paul, LANSBERGEN, Robert Gabriël Maria, LIPSON, Matthew, VAN DEN HEIJKANT, Sander, LEENDERS, Martinus Hendrikus Antonius, DEKKERS, Jeroen, VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien, VAN DER MEULEN, Frits, JANSEN, Maarten Mathijs Marinus, BRUIJN, Marc, VAN DEN BOSCH, Gerrit, KRUIZINGA, Matthias, KAMALI, Mohammad Reza, VAN LOO, Jérôme François Sylvain Virgile, BOGAART, Erik Willem, KRAMER, Ronald Harm Gunther, AZEREDO LIMA, Jorge Manuel, VAN DER GRAAF, Sandra, LYONS, Joseph H, ROUX, Stephen, BROUNS, Derk Servatius Gertruda
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.