SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

When a silicon concentration of a phosphoric acid aqueous solution inside a tank reaches an upper limit value of a specified concentration range, the phosphoric acid aqueous solution is drawn off from the tank and/or an amount of the phosphoric acid aqueous solution returning to the tank is decrease...

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Bibliographische Detailangaben
1. Verfasser:	HINODE, Taiki
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Beschreibung
Zusammenfassung:	When a silicon concentration of a phosphoric acid aqueous solution inside a tank reaches an upper limit value of a specified concentration range, the phosphoric acid aqueous solution is drawn off from the tank and/or an amount of the phosphoric acid aqueous solution returning to the tank is decreased to decrease a liquid amount inside the tank to a value not more than a lower limit value of a specified liquid amount range. When the liquid amount inside the tank decreases to the value not more than the lower limit value of the specified liquid amount range, the phosphoric acid aqueous solution is replenished to the tank to increase the liquid amount inside the tank to a value within the specified liquid amount range and decrease the silicon concentration of the phosphoric acid aqueous solution inside the tank to a value within the specified concentration range.