Wafer Washing Method, and Liquid Chemical Used in Same

[Object] To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. [Solution] A liquid chemical is used, which includes: an alkoxysilane represented by the fol...

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Bibliographische Detailangaben
Hauptverfasser:	WATANABE, Shota, IMACHI, Masayoshi, SAIO, Takashi, ABE, Kazuyuki, TAKATA, Tomohiro, FUKUI, Yuki, OKUMURA, Yuzo, FUKAZAWA, Hiroki, KUMON, Soichi
Format:	Patent
Sprache:	eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	[Object] To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. [Solution] A liquid chemical is used, which includes: an alkoxysilane represented by the following general formula [1]; at least one kind selected from the group consisting of a sulfonic acid represented by the following general formula [2], an anhydride of the sulfonic acid, a salt of the sulfonic acid and a sulfonic acid derivative represented by the following general formula [3]; and a diluent solvent containing at least one kind selected from the group consisting of a hydrocarbon, an ether and a thiol. €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ(R 1 ) a Si(H) b (OR 2 ) 4- a - b €ƒ€ƒ€ƒ€ƒ€ƒ[1] €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒR 3 -S(=O) 2 OH€ƒ€ƒ€ƒ€ƒ€ƒ[2] €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒR 3 -S(=O) 2 O-Si(H) 3- c (R 4 ) c €ƒ€ƒ€ƒ€ƒ€ƒ[3]