LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD

An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

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Bibliographische Detailangaben
Hauptverfasser:	ANTONEVICI, Anca Mihaela, BECKERS, Marcel, TEN KATE, Nicolaas, RIEPEN, Michel, BAETEN, Adrianes Johannes, KUIJPER, Anthonie, STEFFENS, Koen, OTTENS, Joost Jeroen, POLIZZI, Marco, KEMPER, Nicolaas Rudolf
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.