PROCESSING FLUID SUPPLY DEVICE, SUBSTRATE PROCESSING DEVICE, PROCESSING FLUID SUPPLY METHOD, SUBSTRATE PROCESSING METHOD, PROCESSING FLUID PROCESSING DEVICE, AND PROCESSING FLUID PROCESSING METHOD

A processing liquid supplying apparatus is arranged to discharge a processing liquid from a discharge port to supply the processing liquid to a processing object, and the processing liquid supplying apparatus includes a first piping, through the interior of which the processing liquid can flow, the...

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Bibliographische Detailangaben
Hauptverfasser: SUZUKI, Masanori, KAWASE, Nobuo, ARAKI, Hiroyuki, SATO, Tomokatsu, MIYAGI, Masahiro
Format: Patent
Sprache:eng
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Zusammenfassung:A processing liquid supplying apparatus is arranged to discharge a processing liquid from a discharge port to supply the processing liquid to a processing object, and the processing liquid supplying apparatus includes a first piping, through the interior of which the processing liquid can flow, the interior of the first piping being in communication with the discharge port, and an X-ray irradiating means irradiating X-rays onto the processing liquid present inside the first piping. The first piping has an opening in its pipe wall and the opening is closed by a window member formed using a material that can transmit the X-rays, and the X-ray irradiating means irradiates the X-rays onto the processing liquid present inside the first piping via the window member.