Pattern Formation Method

A pattern formation method includes forming a first pattern in a first film in a first region and forming a second pattern in the first film in a second region by using an optical lithography technology. The pattern formation method also includes forming a third pattern corresponding to the first pa...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kasahara, Yusuke, Kondoh, Takehiro, KAWANISHI, Ayako
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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