METHOD OF FABRICATING BOTTOM ELECTRODE

A method of fabricating a bottom electrode includes providing a dielectric layer. An atomic layer deposition is performed to form a bottom electrode material on the dielectric layer. Then, an oxidation process is performed to oxidize part of the bottom electrode material. The oxidized bottom electro...

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Bibliographische Detailangaben
Hauptverfasser: Hsu, Chi-Mao, Chan, Tien-Chen, Lin, Ger-Pin, Chan, Shu-Yen, Tzou, Shih-Fang
Format: Patent
Sprache:eng
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Zusammenfassung:A method of fabricating a bottom electrode includes providing a dielectric layer. An atomic layer deposition is performed to form a bottom electrode material on the dielectric layer. Then, an oxidation process is performed to oxidize part of the bottom electrode material. The oxidized bottom electrode material transforms into an oxide layer. The bottom electrode material which is not oxidized becomes a bottom electrode. A top surface of the bottom electrode includes numerous hill-like profiles. Finally, the oxide layer is removed.