METHOD FOR MANUFACTURING METALLIZED FILM

The present disclosure provides a method for manufacturing a metallized film, the metallized film including: a dielectric film; a vapor-deposited metal electrode formed on a surface of the dielectric film. The vapor-deposited metal electrode includes a plurality of parts which have mutually differen...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHIBA, MASAKI, ADACHI, HIROSHI, TAKAMOTO, YUKINORI, ITOI, SHINSUKE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present disclosure provides a method for manufacturing a metallized film, the metallized film including: a dielectric film; a vapor-deposited metal electrode formed on a surface of the dielectric film. The vapor-deposited metal electrode includes a plurality of parts which have mutually different resistance values. The method includes a step of letting oil adhere to a region in the surface of the dielectric film on which the vapor-deposited metal electrode is to be formed and then bringing a vapor of metal into contact with the surface of the dielectric film. A quantity per unit area of the oil adhering to a part of the region on which a part of the vapor-deposited metal electrode having a relatively low resistance value is to be formed is smaller than a quantity per unit area of the oil adhering to another part of the region on which another part of the vapor-deposited metal electrode having a relatively high resistance value is to be formed.