METHOD FOR TREATING WASTE LIQUID FROM PROCESS OF ETCHING INDIUM TIN OXIDE

This disclosure provides a method for treating an etching waste liquid from an etching process of indium tin oxide comprising hydrochloric acid, acetic acid, tin ions, indium ions and water, comprising the steps of: distilling the etching waste liquid to obtain a distillate comprising hydrochloric a...

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Bibliographische Detailangaben
Hauptverfasser:	Deng, Chuanfeng, Xie, Yongxian, He, Zhiyang, Li, Youlu
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATERTREATMENT OR WASTE MANAGEMENT ELECTROLYTIC OR ELECTROPHORETIC PROCESSES GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS METALLURGY PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	This disclosure provides a method for treating an etching waste liquid from an etching process of indium tin oxide comprising hydrochloric acid, acetic acid, tin ions, indium ions and water, comprising the steps of: distilling the etching waste liquid to obtain a distillate comprising hydrochloric acid and acetic acid and a post-distillation liquid comprising tin ions and indium ions; generating a precipitate by reacting tin ions in the post-distillation liquid with sulfide ions to remove tin ions from the solution so as to obtain a post-precipitation solution containing indium ions; and electrolyzing the post-precipitation solution to obtain crude indium.