NONVOLATILE SEMICONDUCTOR STORAGE DEVICE

A nonvolatile semiconductor storage device having a control gate formed on a semiconductor substrate and including a cylindrical through hole. A block insulating film, a charge storage film, a tunnel insulating film, and a semiconductor layer are formed on a side surface of the control gate inside t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YASUDA, Naoki, KITO, Masaru
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A nonvolatile semiconductor storage device having a control gate formed on a semiconductor substrate and including a cylindrical through hole. A block insulating film, a charge storage film, a tunnel insulating film, and a semiconductor layer are formed on a side surface of the control gate inside the through hole. The tunnel insulating film includes a first insulating film having SiO2 as a base material and containing an element that lowers a band gap of the base material by being added. A density and a density gradient of the element monotonously increase from the semiconductor layer toward the charge storage film.