Lithographic Apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER SANDEN, Jacobus Cornelis Gerardus, ARLEMARK, Erik Johan, TEN KATE, Nicolaas, KOEVOETS, Adrianus Hendrik, JANSSEN, Franciscus Johannes Joseph, LEVASIER, Leon Martin, OVERKAMP, Jim Vincent, DERKS, Sander Catharina Reinier, ENDENDIJK, Wilfred Edward, LAFARRE, Raymond Wilhelmus Louis, DONDERS, Sjoerd Nicolaas Lambertus
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.