ALIGNMENT SYSTEM

An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	COENE, Willem Marie Julia Marcel, HUISMAN, Simon Reinald, SCHELLEKENS, Adrianus Johannes Hendrikus, BOGAART, Erik Willem, POLO, Alessandro, TINNEMANS, Patricius Aloysius Jacobus, DEN BOEF, Arie Jeffrey, YEGANEGI DASTGERDI, Elahe, MATHIJSSEN, Simon Gijsbert Josephus
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.