POLISHING PAD AND METHOD FOR MAKING THE SAME

The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a second surface. The polishing layer is disposed on the first surface of the base layer and has a plurality of sec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FENG, CHUNGIH, LIN, JHIH-GONG, LIN, CHIH-YI, FU, TAI-YUN, HUNG, YUNGANG, YAO, I-PENG
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
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