METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
A method of fabricating a semiconductor device, the method including forming a deposition active layer and a guide pattern on a semiconductor substrate such that the guide pattern delimits an exposed surface of the deposition active layer; and selectively depositing a metal-containing layer on the e...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method of fabricating a semiconductor device, the method including forming a deposition active layer and a guide pattern on a semiconductor substrate such that the guide pattern delimits an exposed surface of the deposition active layer; and selectively depositing a metal-containing layer on the exposed surface of the deposition active layer exposed by the guide pattern, wherein the deposition active layer is a nonmetal layer. |
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