NANOSHEET TRANSISTORS WITH SHARP JUNCTIONS

A method of forming a semiconductor device and resulting structures having nanosheet transistors with sharp junctions by forming a nanosheet stack over a substrate, the nanosheet stack having a plurality of nanosheets alternating with a plurality of sacrificial layers, such that a topmost and a bott...

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Bibliographische Detailangaben
Hauptverfasser: Clevenger, Lawrence A, Cheng, Kangguo, Pranatharthi Haran, Balasubramanian S, Zhang, John
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of forming a semiconductor device and resulting structures having nanosheet transistors with sharp junctions by forming a nanosheet stack over a substrate, the nanosheet stack having a plurality of nanosheets alternating with a plurality of sacrificial layers, such that a topmost and a bottommost layer of the nanosheet stack is a sacrificial layer; forming an oxide recess on a first and a second end of each sacrificial layer; and forming a doped extension region on a first and a second end of each nanosheet.