IMPRINT MOLD AND MANUFACTURING METHOD OF THE SAME

An imprint mold includes a substrate; a pattern on the substrate and having a multi-layered structure; and an etch stop layer between an upper layer and a lower layer of the pattern.

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Bibliographische Detailangaben
Hauptverfasser: CHOI, Sung-Woo, KIM, Chul-Ho, KOOK, Yun-Ho
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An imprint mold includes a substrate; a pattern on the substrate and having a multi-layered structure; and an etch stop layer between an upper layer and a lower layer of the pattern.