LARGE AREA ENERGETIC ION SOURCE

LARGE AREA ENERGETIC ION SOURCE

An RF antenna system for a plasma chamber comprises an RF input coupling a trunk to an RO power supply; two main branches electrically connected to the main trunk, each of the two main branches coupled to a plurality of rod antennas; a plurality of tuning devices, each provided between one of the ro...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Bluck Terry, Adibi Babak
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Beschreibung
Zusammenfassung:An RF antenna system for a plasma chamber comprises an RF input coupling a trunk to an RO power supply; two main branches electrically connected to the main trunk, each of the two main branches coupled to a plurality of rod antennas; a plurality of tuning devices, each provided between one of the rod antennas and the corresponding main branch.