High Purity Ethylenediamine for Semiconductor Applications

Ethylenediamine (EDA) compositions and methods for making the EDA that is suitable for use in thin-film semiconductor processing applications, are disclosed. The EDA is purified to remove water and trace metals. Water levels below about 50 ppm by weight are achieved by passing liquid through 3A type...

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Bibliographische Detailangaben
Hauptverfasser:	Pearlstein Ronald Martin, Dimock Stuart H, Thridandam Hareesh, Mayorga Steven Gerard
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR ACYCLIC OR CARBOCYCLIC COMPOUNDS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY CLEANING CLEANING IN GENERAL CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS,e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES,DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS CONVEYING HANDLING THIN OR FILAMENTARY MATERIAL METALLURGY ORGANIC CHEMISTRY PACKAGES PACKAGING ELEMENTS PACKING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PREVENTION OF FOULING IN GENERAL STORING THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	Ethylenediamine (EDA) compositions and methods for making the EDA that is suitable for use in thin-film semiconductor processing applications, are disclosed. The EDA is purified to remove water and trace metals. Water levels below about 50 ppm by weight are achieved by passing liquid through 3A type molecular sieve in a packed bed. Metallic impurities are removed by distillation and the resulting product is packaged in specially dried and optionally pre-conditioned containers.