COATING SYSTEM AND COATING METHOD

A coating system (1) is provided comprising a coating chamber (20) having arranged therein a coating apparatus (10) for providing a substrate (S) with an organic coating layer. The coating apparatus (10) comprises a coating device (12) for depositing a solvent free, curable liquid organic precursor...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SMELTINK Jeroen Anthonius, TOONEN Leonardus Maria, UNNIKRISHNAN Sandeep, MANDERS Wilhelmus Hubertus, DE VRIES Ike Gerke
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A coating system (1) is provided comprising a coating chamber (20) having arranged therein a coating apparatus (10) for providing a substrate (S) with an organic coating layer. The coating apparatus (10) comprises a coating device (12) for depositing a solvent free, curable liquid organic precursor for said organic coating layer and a curing unit (14) for curing the liquid organic precursor deposited on said substrate (S) by supplying energy to said liquid organic precursor. The coating system further comprises a vacuum pump (30) that, while coating, maintains a pressure inside said coating chamber below 1 mbar. A supply facility (152, 152′) for controllably supplies the curable liquid organic precursor from the reservoir to the coating device (12), The supply facility (152, 52′) has an input (1510) for receiving curable liquid organic precursor from the reservoir. A position of a bottom (150B) of the reservoir is arranged at a height (H1) above the input (1510). The coating system has a first operational mode wherein curable liquid organic precursor to be supplied to the coating apparatus is exposed to a vacuum having a pressure with a first pressure value that is equal to or lower than the chamber pressure value, and has a second operational mode following the first operational mode, wherein the supply facility (152, 152′) supplies the curable liquid organic precursor to the coating device (12).