MEASURING METHOD, STAGE APPARATUS, AND EXPOSURE APPARATUS

An exposure apparatus exposes a substrate with an illumination light via a projection optical system. The apparatus has a base member supported via a first isolating member below the projection optical system; a stage arranged on the base member, and having a holder configured to support the substra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	ARAI Dai
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	An exposure apparatus exposes a substrate with an illumination light via a projection optical system. The apparatus has a base member supported via a first isolating member below the projection optical system; a stage arranged on the base member, and having a holder configured to support the substrate; a metrology frame supported via a second isolating member; a drive system to drive the stage on the base member; a plurality of grating portions on the metrology frame and arranged substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system above the stage; an encoder system on the stage and configured to obtain position information of the stage; and a controller configured to control the drive system based on the position information obtained by the encoder system.