Reconfigurable MOS Varactor

Various particular embodiments include a semiconductor varactor structure including: a semiconductor substrate of a first conductivity type; a semiconductor area of a second conductivity type, different from the first conductivity type, within the semiconductor substrate; a field effect transistor (...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Sun Pinping, Pei Chengwen, Xiu Kai
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Various particular embodiments include a semiconductor varactor structure including: a semiconductor substrate of a first conductivity type; a semiconductor area of a second conductivity type, different from the first conductivity type, within the semiconductor substrate; a field effect transistor (FET) structure within the semiconductor area; and a contact, contacting the semiconductor area, for applying a voltage bias to the semiconductor area.