POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENT

Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.

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Bibliographische Detailangaben
Hauptverfasser:	ASAI Maiko, HISHIDA Shota, ITO Yuuichi, ASANO Hiroshi, TAMAI Kazusei, OTSUKI Shingo, IKEDO Tomoya
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES
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Beschreibung
Zusammenfassung:	Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.