PATTERN INSPECTION APPARATUS

A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a first stage to be able to move up to a first stroke by which an entire surface of an inspection region of the substrate can be irradiated...

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Bibliographische Detailangaben
1. Verfasser: KIKUIRI Nobutaka
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a first stage to be able to move up to a first stroke by which an entire surface of an inspection region of the substrate can be irradiated with the multi-beams, a second stage, arranged on the first stage, to be able to move up to a second stroke sufficiently shorter than the first stroke and to place the substrate thereon, and a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams.