Semiconductor Micro-Hollow Cathode Discharge Device for Plasma Jet Generation

A micro-hollow cathode discharge device. The device includes a first electrode layer comprising a first electrode. A hole is disposed in the first electrode layer. The device also includes a dielectric layer having a first surface that is disposed on the first electrode layer. The hole continues fro...

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Bibliographische Detailangaben
1. Verfasser:	Nikic Dejan
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING HEATING LIGHTING MACHINES OR ENGINES FOR LIQUIDS MECHANICAL ENGINEERING OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDEDFOR PRODUCING MECHANICAL POWER WEAPONS WIND, SPRING WEIGHT AND MISCELLANEOUS MOTORS
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Beschreibung
Zusammenfassung:	A micro-hollow cathode discharge device. The device includes a first electrode layer comprising a first electrode. A hole is disposed in the first electrode layer. The device also includes a dielectric layer having a first surface that is disposed on the first electrode layer. The hole continues from the first electrode layer through the dielectric layer. The device also includes a semi-conducting layer disposed on a second surface of the dielectric layer opposite the first surface. The semi-conducting layer is a semiconductor material that spans across the hole such that the hole terminates at the semi-conducting layer. The device also includes a second electrode layer disposed on the semi-conducting layer opposite the dielectric layer.