Skin Treatment Apparatus And Method
Disclosed is a system and a method for aesthetic skin treatment. The system includes an array of RF electrodes assembled on a flexible or rigid substrate. A plurality of RF voltage generators configured to address individually each of the RF electrodes of the array and supply to each pair of RF elec...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Disclosed is a system and a method for aesthetic skin treatment. The system includes an array of RF electrodes assembled on a flexible or rigid substrate. A plurality of RF voltage generators configured to address individually each of the RF electrodes of the array and supply to each pair of RF electrodes RF voltage. The amplitude of the RF voltage applied to inner pair of RF electrodes is lower than the RF voltage applied to outer pair of RF electrodes. |
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