Skin Treatment Apparatus And Method

Disclosed is a system and a method for aesthetic skin treatment. The system includes an array of RF electrodes assembled on a flexible or rigid substrate. A plurality of RF voltage generators configured to address individually each of the RF electrodes of the array and supply to each pair of RF elec...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Goland Vladimir, Eisenmann Shmulik, Adanny Yossef Ori
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Disclosed is a system and a method for aesthetic skin treatment. The system includes an array of RF electrodes assembled on a flexible or rigid substrate. A plurality of RF voltage generators configured to address individually each of the RF electrodes of the array and supply to each pair of RF electrodes RF voltage. The amplitude of the RF voltage applied to inner pair of RF electrodes is lower than the RF voltage applied to outer pair of RF electrodes.