LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a me...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | MEESTER Arnout Johannes LANDHEER Siebe TANASA Gheorghe MIRANDA Marcio Alexandre Cano THOMAS Ivo Adam Johannes |
description | A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2017285487A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2017285487A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2017285487A13</originalsourceid><addsrcrecordid>eNrjZLDz8Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1FwVPB1BUq6KPi7KfgHuAIlPP3cFUI8XBHqeBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJfGiwkYGhuZGFqYmFuaOhMXGqAPVWKwU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS</title><source>esp@cenet</source><creator>MEESTER Arnout Johannes ; LANDHEER Siebe ; TANASA Gheorghe ; MIRANDA Marcio Alexandre Cano ; THOMAS Ivo Adam Johannes</creator><creatorcontrib>MEESTER Arnout Johannes ; LANDHEER Siebe ; TANASA Gheorghe ; MIRANDA Marcio Alexandre Cano ; THOMAS Ivo Adam Johannes</creatorcontrib><description>A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171005&DB=EPODOC&CC=US&NR=2017285487A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171005&DB=EPODOC&CC=US&NR=2017285487A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MEESTER Arnout Johannes</creatorcontrib><creatorcontrib>LANDHEER Siebe</creatorcontrib><creatorcontrib>TANASA Gheorghe</creatorcontrib><creatorcontrib>MIRANDA Marcio Alexandre Cano</creatorcontrib><creatorcontrib>THOMAS Ivo Adam Johannes</creatorcontrib><title>LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS</title><description>A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDz8Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1FwVPB1BUq6KPi7KfgHuAIlPP3cFUI8XBHqeBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJfGiwkYGhuZGFqYmFuaOhMXGqAPVWKwU</recordid><startdate>20171005</startdate><enddate>20171005</enddate><creator>MEESTER Arnout Johannes</creator><creator>LANDHEER Siebe</creator><creator>TANASA Gheorghe</creator><creator>MIRANDA Marcio Alexandre Cano</creator><creator>THOMAS Ivo Adam Johannes</creator><scope>EVB</scope></search><sort><creationdate>20171005</creationdate><title>LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS</title><author>MEESTER Arnout Johannes ; LANDHEER Siebe ; TANASA Gheorghe ; MIRANDA Marcio Alexandre Cano ; THOMAS Ivo Adam Johannes</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2017285487A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MEESTER Arnout Johannes</creatorcontrib><creatorcontrib>LANDHEER Siebe</creatorcontrib><creatorcontrib>TANASA Gheorghe</creatorcontrib><creatorcontrib>MIRANDA Marcio Alexandre Cano</creatorcontrib><creatorcontrib>THOMAS Ivo Adam Johannes</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MEESTER Arnout Johannes</au><au>LANDHEER Siebe</au><au>TANASA Gheorghe</au><au>MIRANDA Marcio Alexandre Cano</au><au>THOMAS Ivo Adam Johannes</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS</title><date>2017-10-05</date><risdate>2017</risdate><abstract>A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US2017285487A1 |
source | esp@cenet |
subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T04%3A14%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MEESTER%20Arnout%20Johannes&rft.date=2017-10-05&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2017285487A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |